Supporti di rivestimento SiC per incisione semiconduttore

As a professional Chinese manufacturer, supplier and exporter of Silicon Carbide Ceramic Coating. Semicera’s Silicon Carbide Ceramic Coating is widely used in key components of semiconductor manufacturing equipment, especially in processing processes such as CVD and PECV. Semicera is committed to providing advanced technology and product solutions for the semiconductor industry, and welcomes your further consultation.

Designazione

Our company provides SiC coating process services by CVD method on the surface of graphite, ceramics and other materials, so that special gases containing carbon and silicon react at high temperature to obtain high purity SiC molecules, molecules deposited on the surface of the coated materials, forming SIC protective layer.

Main Features

1. High temperature oxidation resistance:
the oxidation resistance is still very good when the temperature is as high as 1600 C.
2. High purity : made by chemical vapor deposition under high temperature chlorination condition.
3. Erosion resistance: high hardness, compact surface, fine particles.
4. Corrosion resistance: acid, alkali, salt and organic reagents.

Main Specifications of CVD-SIC Coating

SiC-CVD Properties
Crystal Structure	FCC β phase
Density	g/cm ³	3.21
Durezza	Vickers hardness	2500
Grain Size	μm	2~10
Chemical Purity	%	99.99995
Heat Capacity	J·kg-1 ·K-1	640
Sublimation Temperature	℃	2700
Felexural Strength	MPa (RT 4-point)	415
Young’ s Modulus	Gpa (4pt bend, 1300℃)	430
Thermal Expansion (C.T.E)	10-6K-1	4.5
Conduttività termica	(W/mK)	300