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Wafer Susceptor is an indispensable core component in the epitaxy process. Semicera provides excellent solutions for Si Epitaxy and SiC Epitaxy processes through precision design and manufacturing. Our Wafer Susceptor ensures uniform heat distribution during the epitaxy process and improves the deposition quality of the monocrystalline silicon (Monocrystalline Silicon) layer. It performs well in different types of MOCVD Susceptors and Barrel Susceptors and is suitable for various semiconductor manufacturing processes.

Semicera’s Wafer Susceptor is made of high-strength materials with excellent high temperature resistance and corrosion resistance, and can remain stable for a long time even under complex epitaxy process conditions. Whether in Si Epitaxy or SiC Epitaxy processes, Semicera’s Susceptor can provide precise temperature control support to ensure the quality consistency of wafers during epitaxy growth.

In addition, Semicera’s Wafer Susceptor is also precisely processed to adapt to a variety of equipment and specification requirements, especially in MOCVD Susceptor and Barrel Susceptor applications. With excellent material selection and process control, our products not only improve production efficiency, but also significantly reduce the defect rate and energy consumption in the process.

For the extremely demanding epitaxy processes in the semiconductor industry, Semikera’s Wafer Susceptor is your ideal choice. Whether for R&D or mass production, our Wafer Susceptor can help customers achieve higher reliability and better crystal structure in Si Epitaxy and SiC Epitaxy processes.